Metal Oxide (MO) and MO-integrated 1D Carbon Nano-Fibrils for increased Storage Capability

Abstract

This work describes a new type of 1D electrode with high open space porosity achieved by PVD and H2-plasma etching. The production steps involve (i) coating of in-situ metal oxide-doped amorphous carbon layers by reactive sputtering technique (ii) top-down nano-structuring of the carbon layer by H2-plasma etching. Preliminary experiments indicate that by 1D nano-structuring of the carbon layers three-fold increase of areal capacitance and energy density of the carbon layers can be achieved. Relying on the presence of nano-scale constituents and metal oxides, it is to expect that synergistic effects occur between the electrically conductive carbon and charge storage capacitive metal oxides and these are cause for increase in capacitance and energy densities.