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Influence of atomic oxygen irradiation during deposition on crystallization of post-annealed barium zirconate thin films

Iguchi, Fumitada and Shibata, Yoshikazu and Miyazaki, Takamichi and Sata, Noriko and Yugami, Hiroo (2014) Influence of atomic oxygen irradiation during deposition on crystallization of post-annealed barium zirconate thin films. Japanese Journal of Applied Physics, 53 (11), p. 115503. Institute of Physics (IOP) Publishing. DOI: 10.7567/JJAP.53.115503 ISSN 0021-4922

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Official URL: http://iopscience.iop.org/1347-4065/53/11/115503/article

Abstract

The role of atomic oxygen irradiation in the epitaxial crystallization of yttrium-doped barium zirconate thin films fabricated by pulsed laser deposition (PLD) was investigated. X-ray diffraction and transmission electron microscopy revealed that, for films deposited without irradiation, random nucleation and growth occurred below the onset temperature for continuous crystallization at the film–interlayer interface. In contrast, for films deposited with oxygen irradiation, random nucleation and growth was not detected at the temperature of continuous crystallization, which facilitates epitaxial crystallization in these films. This study suggests the combined low temperature deposition with atomic oxygen irradiation and post-annealing could control microstructure of solid-state electrochemical devices such as solid oxide fuel cells and solid-state lithium secondary batteries.

Item URL in elib:https://elib.dlr.de/91864/
Document Type:Article
Title:Influence of atomic oxygen irradiation during deposition on crystallization of post-annealed barium zirconate thin films
Authors:
AuthorsInstitution or Email of AuthorsAuthors ORCID iD
Iguchi, FumitadaGraduate School of Engineering, Tohoku UniversityUNSPECIFIED
Shibata, YoshikazuGraduate School of Engineering, Tohoku UniversityUNSPECIFIED
Miyazaki, TakamichiGraduate School of Engineering, Tohoku UniversityUNSPECIFIED
Sata, NorikoDLRUNSPECIFIED
Yugami, HirooGraduate School of Engineering, Tohoku UniversityUNSPECIFIED
Date:15 October 2014
Journal or Publication Title:Japanese Journal of Applied Physics
Refereed publication:Yes
Open Access:Yes
Gold Open Access:No
In SCOPUS:Yes
In ISI Web of Science:Yes
Volume:53
DOI :10.7567/JJAP.53.115503
Page Range:p. 115503
Publisher:Institute of Physics (IOP) Publishing
ISSN:0021-4922
Status:Published
Keywords:atomic oxygen, radical oxygen, solid phase epitaxy, pulsed laser deposition (PLD), perovskite-type proton conductor
HGF - Research field:Energy
HGF - Program:Efficient Energy Conversion and Use (old)
HGF - Program Themes:Fuel Cells (old)
DLR - Research area:Energy
DLR - Program:E EV - Energy process technology
DLR - Research theme (Project):E - Electrochemical Processes (old)
Location: Stuttgart
Institutes and Institutions:Institute of Engineering Thermodynamics > Electrochemical Energy Technology
Deposited By: Metzger-Sata, Dr. Noriko
Deposited On:17 Nov 2014 16:17
Last Modified:31 Jul 2019 19:49

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