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Thermal Plasma Chemical Vapor Deposition of Si-Based Ceramic Coatings from Liquid Precursors

Bouyer, E. and Schiller, G. and Müller, M. and Henne, R. (2001) Thermal Plasma Chemical Vapor Deposition of Si-Based Ceramic Coatings from Liquid Precursors. Plasma Chemistry and Plasma Processing, 21 (4), pp. 523-546.

Full text not available from this repository.


Item URL in elib:https://elib.dlr.de/2459/
Document Type:Article
Additional Information: LIDO-Berichtsjahr=2001,
Title:Thermal Plasma Chemical Vapor Deposition of Si-Based Ceramic Coatings from Liquid Precursors
Authors:
AuthorsInstitution or Email of AuthorsAuthors ORCID iD
Bouyer, E.UNSPECIFIEDUNSPECIFIED
Schiller, G.UNSPECIFIEDUNSPECIFIED
Müller, M.UNSPECIFIEDUNSPECIFIED
Henne, R.UNSPECIFIEDUNSPECIFIED
Date:2001
Journal or Publication Title:Plasma Chemistry and Plasma Processing
Refereed publication:Yes
Open Access:No
Gold Open Access:No
In SCOPUS:No
In ISI Web of Science:Yes
Volume:21
Page Range:pp. 523-546
Status:Published
HGF - Research field:Energy
HGF - Program:Efficient Energy Conversion (old)
HGF - Program Themes:E BZ - Fuel cells (old)
DLR - Research area:Energy
DLR - Program:E BZ - Fuel cells
DLR - Research theme (Project):UNSPECIFIED
Location: Stuttgart
Institutes and Institutions:Institute of Engineering Thermodynamics
Deposited By: DLR-Beauftragter, elib
Deposited On:16 Sep 2005
Last Modified:06 Jan 2010 15:09

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