Tell a friend
Print
Bouyer, E. and Müller, M. and Schiller, G. and Henne, R. (1999) Conversion of silanes into SiC by RF plasma technology. In: Conference Proceedings UTSC 99, pp. 853-858. DVS-Verlag GmbH, Düsseldorf. UTSC (United Thermal Spray Conference) 99 - Coating in Practice, Düsseldorf, 17-19 March 1999. ISBN 3-87155-653-X.
Full text not available from this repository.
| Item URL in elib: | https://elib.dlr.de/2380/ | |||||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Document Type: | Conference or Workshop Item (Paper) | |||||||||||||||
| Additional Information: | LIDO-Berichtsjahr=2000, | |||||||||||||||
| Title: | Conversion of silanes into SiC by RF plasma technology | |||||||||||||||
| Authors: |
| |||||||||||||||
| Date: | 1999 | |||||||||||||||
| Journal or Publication Title: | Conference Proceedings UTSC 99 | |||||||||||||||
| Open Access: | No | |||||||||||||||
| Gold Open Access: | No | |||||||||||||||
| In SCOPUS: | No | |||||||||||||||
| In ISI Web of Science: | No | |||||||||||||||
| Page Range: | pp. 853-858 | |||||||||||||||
| Editors: |
| |||||||||||||||
| Publisher: | DVS-Verlag GmbH, Düsseldorf | |||||||||||||||
| ISBN: | 3-87155-653-X | |||||||||||||||
| Status: | Published | |||||||||||||||
| Event Title: | UTSC (United Thermal Spray Conference) 99 - Coating in Practice, Düsseldorf, 17-19 March 1999 | |||||||||||||||
| HGF - Research field: | Energy | |||||||||||||||
| HGF - Program: | other | |||||||||||||||
| HGF - Program Themes: | E - no assignment | |||||||||||||||
| DLR - Research area: | Energy | |||||||||||||||
| DLR - Program: | E - no assignment | |||||||||||||||
| DLR - Research theme (Project): | UNSPECIFIED | |||||||||||||||
| Location: | Stuttgart | |||||||||||||||
| Institutes and Institutions: | Institute of Engineering Thermodynamics | |||||||||||||||
| Deposited By: | DLR-Beauftragter, elib | |||||||||||||||
| Deposited On: | 16 Sep 2005 | |||||||||||||||
| Last Modified: | 06 Jan 2010 15:03 |
Repository Staff Only: item control page
