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Conversion of silanes into SiC by RF plasma technology

Bouyer, E. and Müller, M. and Schiller, G. and Henne, R. (1999) Conversion of silanes into SiC by RF plasma technology. In: Conference Proceedings UTSC 99, pp. 853-858. DVS-Verlag GmbH, Düsseldorf. UTSC (United Thermal Spray Conference) 99 - Coating in Practice, Düsseldorf, 17-19 March 1999. ISBN 3-87155-653-X

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Item URL in elib:https://elib.dlr.de/2380/
Document Type:Conference or Workshop Item (Paper)
Additional Information: LIDO-Berichtsjahr=2000,
Title:Conversion of silanes into SiC by RF plasma technology
Authors:
AuthorsInstitution or Email of AuthorsAuthors ORCID iD
Bouyer, E.UNSPECIFIEDUNSPECIFIED
Müller, M.UNSPECIFIEDUNSPECIFIED
Schiller, G.UNSPECIFIEDUNSPECIFIED
Henne, R.UNSPECIFIEDUNSPECIFIED
Date:1999
Journal or Publication Title:Conference Proceedings UTSC 99
Open Access:No
Gold Open Access:No
In SCOPUS:No
In ISI Web of Science:No
Page Range:pp. 853-858
Editors:
EditorsEmail
Lugscheider, E.UNSPECIFIED
Kammer, P.A.UNSPECIFIED
Publisher:DVS-Verlag GmbH, Düsseldorf
ISBN:3-87155-653-X
Status:Published
Event Title:UTSC (United Thermal Spray Conference) 99 - Coating in Practice, Düsseldorf, 17-19 March 1999
HGF - Research field:Energy
HGF - Program:other
HGF - Program Themes:E - no assignment
DLR - Research area:Energy
DLR - Program:E - no assignment
DLR - Research theme (Project):UNSPECIFIED
Location: Stuttgart
Institutes and Institutions:Institute of Engineering Thermodynamics
Deposited By: DLR-Beauftragter, elib
Deposited On:16 Sep 2005
Last Modified:06 Jan 2010 15:03

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