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Radio Frequency Plasma Processing to Produce Chromium Sputter Targets

Müller, M. and Heimann, R.B. and Gitzhofer, F. and Boulos, M.I. and Schwarz, K. (2000) Radio Frequency Plasma Processing to Produce Chromium Sputter Targets. Journal of Thermal Spray Technology, Volume 9 (4), pp. 488-493.

Full text not available from this repository.


Item URL in elib:https://elib.dlr.de/2361/
Document Type:Article
Additional Information: LIDO-Berichtsjahr=2000,
Title:Radio Frequency Plasma Processing to Produce Chromium Sputter Targets
Authors:
AuthorsInstitution or Email of AuthorsAuthors ORCID iD
Müller, M.UNSPECIFIEDUNSPECIFIED
Heimann, R.B.TU Bergakademie FreibergUNSPECIFIED
Gitzhofer, F.Université de SherbrookeUNSPECIFIED
Boulos, M.I.Université de SherbrookeUNSPECIFIED
Schwarz, K.Freiberger Nichteisen-MetallUNSPECIFIED
Date:2000
Journal or Publication Title:Journal of Thermal Spray Technology
Refereed publication:Yes
Open Access:No
Gold Open Access:No
In SCOPUS:No
In ISI Web of Science:Yes
Volume:Volume 9
Page Range:pp. 488-493
Status:Published
Keywords:chromium target; copper substrate; powder spheroidization; RF plasma spraying; tensile adhesion
HGF - Research field:Energy
HGF - Program:other
HGF - Program Themes:E - no assignment
DLR - Research area:Energy
DLR - Program:E - no assignment
DLR - Research theme (Project):UNSPECIFIED
Location: Stuttgart
Institutes and Institutions:Institute of Engineering Thermodynamics
Deposited By: DLR-Beauftragter, elib
Deposited On:16 Sep 2005
Last Modified:06 Jan 2010 15:02

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