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Brauch, U. and Hoffmann, T. and Springer, R. (2000) Die optische Lithographie eine Schlüsseltechnologie der Mikrostrukturierung. LaserOpto, 32 (4), pp. 59-66.
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| Item URL in elib: | https://elib.dlr.de/2098/ | ||||||||||||||||
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| Document Type: | Article | ||||||||||||||||
| Additional Information: | LIDO-Berichtsjahr=2001, | ||||||||||||||||
| Title: | Die optische Lithographie eine Schlüsseltechnologie der Mikrostrukturierung | ||||||||||||||||
| Authors: |
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| Date: | 2000 | ||||||||||||||||
| Journal or Publication Title: | LaserOpto | ||||||||||||||||
| Refereed publication: | Yes | ||||||||||||||||
| Open Access: | No | ||||||||||||||||
| Gold Open Access: | No | ||||||||||||||||
| In SCOPUS: | No | ||||||||||||||||
| In ISI Web of Science: | Yes | ||||||||||||||||
| Volume: | 32 | ||||||||||||||||
| Page Range: | pp. 59-66 | ||||||||||||||||
| Status: | Published | ||||||||||||||||
| Keywords: | Optical lithography, pattern generator, wafer stepper, minimum feature size, depth of focus, wavelength, numerical aperture, mask reticle, enthancement techniques, off-axis illumination, optical proximity correction, phase-shift masks, laser direct writer, laser diode, pixel head, writing strategy, throughput. | ||||||||||||||||
| HGF - Research field: | Energy | ||||||||||||||||
| HGF - Program: | Aeronautics | ||||||||||||||||
| HGF - Program Themes: | other | ||||||||||||||||
| DLR - Research area: | Energy | ||||||||||||||||
| DLR - Program: | L - no assignment | ||||||||||||||||
| DLR - Research theme (Project): | L - Laser Research and Technology (old) | ||||||||||||||||
| Location: | Stuttgart | ||||||||||||||||
| Institutes and Institutions: | Institute of Technical Physics | ||||||||||||||||
| Deposited By: | DLR-Beauftragter, elib | ||||||||||||||||
| Deposited On: | 16 Sep 2005 | ||||||||||||||||
| Last Modified: | 06 Jan 2010 14:41 |
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