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Characterization of thin-film adhesion and phonon lifetimes in Al/Si membranes by picosecond ultrasonics

Grossmann, Martin and Schubert, Martin and He, Chuan and Brick, Delia and Scheer, Elke and Hettich, Mike and Gusev, Vitalyi and Dekorsy, Thomas (2017) Characterization of thin-film adhesion and phonon lifetimes in Al/Si membranes by picosecond ultrasonics. New Journal of Physics, 19 (5), 053019. Institute of Physics (IOP) Publishing. doi: 10.1088/1367-2630/aa6d05. ISSN 1367-2630.

Full text not available from this repository.

Official URL: http://dx.doi.org/10.1088/1367-2630/aa6d05

Abstract

We quantitatively study interfacial adhesion in a two-layer membrane system consisting of Al and Si with femtosecond time-resolved laser spectroscopy. High-frequency acoustic pulses in the sub-THz regime are utilized to characterize the membrane system. In order to explain the distinct features of the measured data, a spring model for the Al/Si interface is employed.Weshow that acoustic dissipation in this system needs to be included for accurate modeling of the interface adhesion over a broad frequency range. Thismodeling approach yields a spring constant of hAl-Si = 17 kg nm-2 s-2, an acoustic phonon lifetime of tAl = 68 ps at 240 GHz in polycrystalline Al and a frequency dependence of the lifetime in Si μ w-1 in thefrequency range from50–800 GHz.

Item URL in elib:https://elib.dlr.de/112498/
Document Type:Article
Title:Characterization of thin-film adhesion and phonon lifetimes in Al/Si membranes by picosecond ultrasonics
Authors:
AuthorsInstitution or Email of AuthorsAuthor's ORCID iDORCID Put Code
Grossmann, MartinUNSPECIFIEDUNSPECIFIEDUNSPECIFIED
Schubert, MartinUNSPECIFIEDUNSPECIFIEDUNSPECIFIED
He, ChuanUNSPECIFIEDUNSPECIFIEDUNSPECIFIED
Brick, DeliaUNSPECIFIEDUNSPECIFIEDUNSPECIFIED
Scheer, ElkeUNSPECIFIEDUNSPECIFIEDUNSPECIFIED
Hettich, MikeUNSPECIFIEDUNSPECIFIEDUNSPECIFIED
Gusev, VitalyiUNSPECIFIEDUNSPECIFIEDUNSPECIFIED
Dekorsy, Thomasinstitute of technical physics, dlrhttps://orcid.org/0000-0003-2257-2854UNSPECIFIED
Date:17 May 2017
Journal or Publication Title:New Journal of Physics
Refereed publication:Yes
Open Access:Yes
Gold Open Access:Yes
In SCOPUS:Yes
In ISI Web of Science:Yes
Volume:19
DOI:10.1088/1367-2630/aa6d05
Page Range:053019
Publisher:Institute of Physics (IOP) Publishing
ISSN:1367-2630
Status:Published
Keywords:interface adhesion, time domain spectroscopy, phonons, non-destructive testing, intrinsic damping
HGF - Research field:Aeronautics, Space and Transport
HGF - Program:Aeronautics
HGF - Program Themes:fixed-wing aircraft
DLR - Research area:Aeronautics
DLR - Program:L AR - Aircraft Research
DLR - Research theme (Project):L - Laser Research and Technology (old)
Location: Stuttgart
Institutes and Institutions:Institute of Technical Physics
Deposited By: Dekorsy, Prof. Dr. Thomas
Deposited On:12 Jun 2017 08:46
Last Modified:08 Mar 2018 18:47

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