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Enhancing the Thermoelectric Properties of the Electroplated Bi2Te3 Films by Tuning the Pulse Off-to-on Ratio

Zhou, Aijun and Fu, Qiang and Zhang, Wenhua and Yang, Bin and Li, Jingze and Ziolkowski, Pawel and Müller, Eckhard and Xu, Dongyan (2015) Enhancing the Thermoelectric Properties of the Electroplated Bi2Te3 Films by Tuning the Pulse Off-to-on Ratio. Electrochimica Acta, 178, pp. 217-224. Elsevier. DOI: 10.1016/j.electacta.2015.07.164 ISSN 0013-4686

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Abstract

The electroplating method has been widely used to synthesize Bi2Te3 thin films due to many advantages including low cost, non-vacuum operation, and compatibility with microfabrication processes. However, the structure-property correlation of the electroplated Bi2Te3 thin films has not been well studied yet due to a lack of systematic properties characterization. In this work, we systematically studied the dependence of the composition, microstructure, and thermoelectric properties on the deposition parameters for the Bi2Te3 thin films prepared by the pulsed electroplating method. It is shown that a deposition pulse potential of 0 mV vs. Ag/AgCl (saturated KCl) and a large pulse off-to-on ratio are advantageous to improve the stoichiometry and morphology of the deposited films. We demonstrated that the thermoelectric figure of merit of the electroplated Bi2Te3 films can be enhanced by increasing the pulse off-to-on ratio, which is mainly due to the reduced thermal conductivity and the increased Seebeck coefficient. At room temperature, a maximum thermoelectric figure of merit of 0.16 is obtained at a pulse off-to-on ratio of 50, which is among the highest values for the electroplated Bi2Te3 films.

Item URL in elib:https://elib.dlr.de/100086/
Document Type:Article
Title:Enhancing the Thermoelectric Properties of the Electroplated Bi2Te3 Films by Tuning the Pulse Off-to-on Ratio
Authors:
AuthorsInstitution or Email of AuthorsAuthors ORCID iD
Zhou, AijunState Key Laboratory of Electronic Thin films and Integrated Devices, School of Microelectronics and Solid-State Electronics, University of Electronic Science and Technology of China, Chengdu 610054, ChinaUNSPECIFIED
Fu, QiangDepartment of Mechanical and Automation Engineering, The Chinese University of Hong Kong, Shatin, New Territories, Hong Kong Special Administrative Region and Shenzhen Research Institute, The Chinese University of Hong Kong, Shenzhen 518057, ChinaUNSPECIFIED
Zhang, WenhuaDepartment of Mechanical and Automation Engineering, The Chinese University of Hong Kong, Shatin, New Territories, Hong Kong Special Administrative Region and Shenzhen Research Institute, The Chinese University of Hong Kong, Shenzhen 518057, ChinaUNSPECIFIED
Yang, BinState Key Laboratory of Electronic Thin films and Integrated Devices, School of Microelectronics and Solid-State Electronics, University of Electronic Science and Technology of China, Chengdu 610054, ChinaUNSPECIFIED
Li, JingzeState Key Laboratory of Electronic Thin films and Integrated Devices, School of Microelectronics and Solid-State Electronics, University of Electronic Science and Technology of China, Chengdu 610054, ChinaUNSPECIFIED
Ziolkowski, PawelGerman Aerospace Center, Institute of Materials Research, Köln, GermanyUNSPECIFIED
Müller, EckhardGerman Aerospace Center, Institute of Materials Research, Köln, Germany and Institute for Inorganic and Analytical Chemistry, Justus-Liebig-Universität Gießen, Heinrich-Buff-Ring 58, 35392 Gießen, GermanyUNSPECIFIED
Xu, DongyanDepartment of Mechanical and Automation Engineering, The Chinese University of Hong Kong, Shatin, New Territories, Hong Kong Special Administrative Region and Shenzhen Research Institute, The Chinese University of Hong Kong, Shenzhen 518057, ChinaUNSPECIFIED
Date:31 July 2015
Journal or Publication Title:Electrochimica Acta
Refereed publication:Yes
Open Access:No
Gold Open Access:No
In SCOPUS:Yes
In ISI Web of Science:Yes
Volume:178
DOI :10.1016/j.electacta.2015.07.164
Page Range:pp. 217-224
Publisher:Elsevier
ISSN:0013-4686
Status:Published
Keywords:Bi2Te3 films; pulsed electroplating; thermoelectric properties; pulse off-to-on ratio
HGF - Research field:Energy
HGF - Program:Efficient Energy Conversion and Use (old)
HGF - Program Themes:Energy-efficient Processes (old)
DLR - Research area:Energy
DLR - Program:E EV - Energy process technology
DLR - Research theme (Project):E - Thermochemical Processes (old)
Location: Köln-Porz
Institutes and Institutions:Institute of Materials Research > Thermoelectric Materials and Systems
Deposited By: Zabrocki, Dr. Knud
Deposited On:27 Nov 2015 12:23
Last Modified:06 Sep 2019 15:16

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