Highly-Parallel Laser Lithography

Brauch, U. and Colletto, C. and Höfflinger, B. and Hoffmann, T. and Menschig, A. and Opower, H. and Scharl, S. and Schomburg, C. and Springer, R. (1999) Highly-Parallel Laser Lithography. In: precision engineering-nanotechnology: Proc. of the 1st International euspen Conf. Berichte aus der Fertigungstechnik, Vol.1. Shaker Verlag, Aachen. ISBN 3-8265-6085-X.

Full text not available from this repository.

Document Type:

Contribution to a Collection

Additional Information:

LIDO-Berichtsjahr=1999,

Title:

Highly-Parallel Laser Lithography

Authors:

Authors	Institution or Email of Authors
Brauch, U.
Colletto, C.
Höfflinger, B.
Hoffmann, T.
Menschig, A.
Opower, H.
Scharl, S.
Schomburg, C.
Springer, R.

Date:

1999

Journal or Publication Title:

precision engineering-nanotechnology: Proc. of the 1st International euspen Conf.

Refereed publication:

Yes

In ISI Web of Science:

Volume:

Vol.1

Editors:

Editors	Email
McKeown, P.
Corbett, J.
Bonis, M.
Sartori, S.
Kunzmann, H.
Weck, M.
Brinksmeier, E.
Preuß, W.
Riemer, O.

Publisher:

Shaker Verlag, Aachen

Series Name:

Berichte aus der Fertigungstechnik

ISBN:

3-8265-6085-X

Status:

Published

HGF - Research field:

Energy

HGF - Program:

Aeronautics

HGF - Program Themes:

L - no assignement

DLR - Research area:

Energy

DLR - Program:

L - no assignement

DLR - Research theme (Project):

L - Laser Research and Technology

Location:

Stuttgart

Institutes and Institutions:

Institute of Technical Physics

Deposited By:

elib DLR-Beauftragter

Deposited On:

16 Sep 2005

Last Modified:

06 Jan 2010 14:38

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