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Highly-Parallel Laser Lithography

Brauch, U. and Colletto, C. and Höfflinger, B. and Hoffmann, T. and Menschig, A. and Opower, H. and Scharl, S. and Schomburg, C. and Springer, R. (1999) Highly-Parallel Laser Lithography. In: precision engineering-nanotechnology: Proc. of the 1st International euspen Conf. Berichte aus der Fertigungstechnik, Vol.1. Shaker Verlag, Aachen. ISBN 3-8265-6085-X.

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Document Type:Contribution to a Collection
Additional Information: LIDO-Berichtsjahr=1999,
Title:Highly-Parallel Laser Lithography
Authors:
AuthorsInstitution or Email of Authors
Brauch, U.UNSPECIFIED
Colletto, C.UNSPECIFIED
Höfflinger, B.UNSPECIFIED
Hoffmann, T.UNSPECIFIED
Menschig, A.UNSPECIFIED
Opower, H.UNSPECIFIED
Scharl, S.UNSPECIFIED
Schomburg, C.UNSPECIFIED
Springer, R.UNSPECIFIED
Date:1999
Journal or Publication Title:precision engineering-nanotechnology: Proc. of the 1st International euspen Conf.
Refereed publication:Yes
In ISI Web of Science:No
Volume:Vol.1
Editors:
EditorsEmail
McKeown, P.UNSPECIFIED
Corbett, J.UNSPECIFIED
Bonis, M.UNSPECIFIED
Sartori, S.UNSPECIFIED
Kunzmann, H.UNSPECIFIED
Weck, M.UNSPECIFIED
Brinksmeier, E.UNSPECIFIED
Preuß, W.UNSPECIFIED
Riemer, O.UNSPECIFIED
Publisher:Shaker Verlag, Aachen
Series Name:Berichte aus der Fertigungstechnik
ISBN:3-8265-6085-X
Status:Published
HGF - Research field:Energy
HGF - Program:Aeronautics
HGF - Program Themes:other
DLR - Research area:Energy
DLR - Program:L - no assignement
DLR - Research theme (Project):L - Laser Research and Technology
Location: Stuttgart
Institutes and Institutions:Institute of Technical Physics
Deposited By: elib DLR-Beauftragter
Deposited On:16 Sep 2005
Last Modified:06 Jan 2010 14:38

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