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Atomic Hydrogen Concentration Profiles at Filaments Used for Chemical Vapor Deposition of Diamond

Schäfer, L. and Klages, C.P. and Meier, U. and Kohse-Höinghaus, K. (1991) Atomic Hydrogen Concentration Profiles at Filaments Used for Chemical Vapor Deposition of Diamond. Appl. Phys. Lett., 58, pp. 571-573.

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Document Type:Article
Additional Information: LIDO-Berichtsjahr=1991,
Title:Atomic Hydrogen Concentration Profiles at Filaments Used for Chemical Vapor Deposition of Diamond
Authors:
AuthorsInstitution or Email of Authors
Schäfer, L.UNSPECIFIED
Klages, C.P.UNSPECIFIED
Meier, U.UNSPECIFIED
Kohse-Höinghaus, K.UNSPECIFIED
Date:1991
Journal or Publication Title:Appl. Phys. Lett.
Refereed publication:Yes
In ISI Web of Science:Yes
Volume:58
Page Range:pp. 571-573
Status:Published
HGF - Research field:Energy
HGF - Program:other
HGF - Program Themes:other
DLR - Research area:Energy
DLR - Program:no assignment
DLR - Research theme (Project):UNSPECIFIED
Location: Stuttgart
Institutes and Institutions:Institute of Combustion Technology > Institut für Physikalische Chemie der Verbrennung
Deposited By: elib DLR-Beauftragter
Deposited On:02 Apr 2006
Last Modified:27 Apr 2009 06:10

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