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Brauch, U. and Hoffmann, T. and Springer, R. (2000) Die optische Lithographie eine Schlüsseltechnologie der Mikrostrukturierung. LaserOpto, 32 (4), pp. 59-66.
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| Document Type: | Article | ||||||||
|---|---|---|---|---|---|---|---|---|---|
| Additional Information: | LIDO-Berichtsjahr=2001, | ||||||||
| Title: | Die optische Lithographie eine Schlüsseltechnologie der Mikrostrukturierung | ||||||||
| Authors: |
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| Date: | 2000 | ||||||||
| Journal or Publication Title: | LaserOpto | ||||||||
| Refereed publication: | Yes | ||||||||
| In ISI Web of Science: | Yes | ||||||||
| Volume: | 32 | ||||||||
| Page Range: | pp. 59-66 | ||||||||
| Status: | Published | ||||||||
| Keywords: | Optical lithography, pattern generator, wafer stepper, minimum feature size, depth of focus, wavelength, numerical aperture, mask reticle, enthancement techniques, off-axis illumination, optical proximity correction, phase-shift masks, laser direct writer, laser diode, pixel head, writing strategy, throughput. | ||||||||
| HGF - Research field: | Energy | ||||||||
| HGF - Program: | Aeronautics | ||||||||
| HGF - Program Themes: | other | ||||||||
| DLR - Research area: | Energy | ||||||||
| DLR - Program: | L - no assignement | ||||||||
| DLR - Research theme (Project): | L - Laser Research and Technology | ||||||||
| Location: | Stuttgart | ||||||||
| Institutes and Institutions: | Institute of Technical Physics | ||||||||
| Deposited By: | elib DLR-Beauftragter | ||||||||
| Deposited On: | 16 Sep 2005 | ||||||||
| Last Modified: | 06 Jan 2010 14:41 |
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