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Die optische Lithographie – eine Schlüsseltechnologie der Mikrostrukturierung

Brauch, U. and Hoffmann, T. and Springer, R. (2000) Die optische Lithographie – eine Schlüsseltechnologie der Mikrostrukturierung. LaserOpto, 32 (4), pp. 59-66.

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Document Type:Article
Additional Information: LIDO-Berichtsjahr=2001,
Title:Die optische Lithographie – eine Schlüsseltechnologie der Mikrostrukturierung
Authors:
AuthorsInstitution or Email of Authors
Brauch, U.UNSPECIFIED
Hoffmann, T.Institut für Mikroelektronik Stuttgart,IMS
Springer, R.Institut für Mikroelektronik Stuttgart, IMS
Date:2000
Journal or Publication Title:LaserOpto
Refereed publication:Yes
In ISI Web of Science:Yes
Volume:32
Page Range:pp. 59-66
Status:Published
Keywords:Optical lithography, pattern generator, wafer stepper, minimum feature size, depth of focus, wavelength, numerical aperture, mask reticle, enthancement techniques, off-axis illumination, optical proximity correction, phase-shift masks, laser direct writer, laser diode, pixel head, writing strategy, throughput.
HGF - Research field:Energy
HGF - Program:Aeronautics
HGF - Program Themes:other
DLR - Research area:Energy
DLR - Program:L - no assignement
DLR - Research theme (Project):L - Laser Research and Technology
Location: Stuttgart
Institutes and Institutions:Institute of Technical Physics
Deposited By: elib DLR-Beauftragter
Deposited On:16 Sep 2005
Last Modified:06 Jan 2010 14:41

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